Beschreibung der Optionen:
6.1) Software update
10.1) extension of warranty to 60 months;
13.4.1) German manual;
14.1) plasma based decomposition and deposition;
16.1) dedicated refill station;
17.1) > 95 %;
18.1) additionally using of following passive dopants, such as:
• nitrogen,
• germanium,
• phosphorus;
21.1) possible passive dopant concentrations in the deposited glass material measured after the deposition process (in mol%):
• Al2O3 > 3,
• SiF4 > 1,
• B2O3 > 5;
22.1) further passive dopants such as alkaline earths;
23.1) all passive dopants included in the machine;
24.1) other rare earth dopants;
25.1) rare earth halides;
26.1) all rare earth dopants included in the machine;
28.1) possible rare earth dopant concentrations in the deposited glass material measured after the deposition process (in mol%): RE2O3 > 0.3;
29.1) repeatability of doping concentration:< 0.01 mol% for active and passive dopants;
31.1) available chemical purity for all precursors (trace metal basis): 99.999 % (6N);
33.1) loading in a dedicated filling station;
36.1) minimum deposition length: ≥ 500 mm;
37.1) typical substrate tube inner diameter (Øinner):10 > Øinner > 30 mm;
39.1) optical characterization and control of deposition process (e.g. by means of optical spectrometer);
47.1) dedicated emergency mode;
48.1) doped material with:
• Al2O3 > 3,
• Tm2O3 > 0.3,
• (in mol%).